Liquid-Precursor Electron-Beam-Induced Deposition (LP-EBID) is a novel technique for direct-write patterning of nanostructures


Liquid-Precursor Electron-Beam-Induced Deposition (LP-EBID)
LP-EBID is a novel technique for direct-write patterning of high-purity, high-fidelity metal nanostructures. A focused beam of keV electrons enters the liquid reservoir directly or through a thin membrane (e.g., polyimide, silicon nitride, graphene), interacts with the membrane and the liquid precursor, and forms a solid deposit of the reduced metal species (so far: Pt, Au, Ag and Cu; Cr, Ni and Pd; AuPt and AuAg; CdS and PbS). In the complementary process, LP-EBIE(tching), material in contact with the liquid is selectively removed from under the electron beam (so far: Si3N4, Cu and Au).


Book chapter: Nanoscale Deposition and Etching (Liquid Cell Electron Microscopy)
LP-EBID of Pt: Purity (Nano Letters)
LP-EBID of Pt: Resolution (Nanotechnology)
LP-EBID of Pt: Substrates (Nanoscale)
LP-EBID of Au (Nanotechnology)
LP-EBID of Bimetallics (Nanoparticles)